Influence of Annealing Temperature on the Antibacterial Activities and Photoactivity of N-Doped TiO2 Films by Ion Beam Assistance


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The N-doped TiO2 films were prepared by cathode vacuum arc deposition with ion beam assisted. Influence of annealing temperature on the microstructure, optical property, photocatalytic activity and antibacterial activities of the N-doped TiO2 films was studied. The experimental results indicate that annealing treatment significantly affects both microstructure and photoactivity. All the as deposited N-doped TiO2 films retained an amorphous structure, the crystalline structure of N-doped TiO2 films annealed in the range 400°C- 600°C were examined to be of anatase structure with a (101) preferential orientation,photocatalytic activity of the N-doped TiO2 film annealed at 500°C was best under visible light, The N-doped TiO2 films against E. coli and S. aureus had more than 99% antibacterial rate, and the antibacterial activity of the N-doped TiO2 films stronger slightly with the increase of the annealing temperature.



Advanced Materials Research (Volumes 189-193)

Edited by:

Zhengyi Jiang, Shanqing Li, Jianmin Zeng, Xiaoping Liao and Daoguo Yang




X. L. Cheng et al., "Influence of Annealing Temperature on the Antibacterial Activities and Photoactivity of N-Doped TiO2 Films by Ion Beam Assistance", Advanced Materials Research, Vols. 189-193, pp. 1258-1262, 2011

Online since:

February 2011




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