Influence of Annealing Temperature on the Antibacterial Activities and Photoactivity of N-Doped TiO2 Films by Ion Beam Assistance

Abstract:

Article Preview

The N-doped TiO2 films were prepared by cathode vacuum arc deposition with ion beam assisted. Influence of annealing temperature on the microstructure, optical property, photocatalytic activity and antibacterial activities of the N-doped TiO2 films was studied. The experimental results indicate that annealing treatment significantly affects both microstructure and photoactivity. All the as deposited N-doped TiO2 films retained an amorphous structure, the crystalline structure of N-doped TiO2 films annealed in the range 400°C- 600°C were examined to be of anatase structure with a (101) preferential orientation,photocatalytic activity of the N-doped TiO2 film annealed at 500°C was best under visible light, The N-doped TiO2 films against E. coli and S. aureus had more than 99% antibacterial rate, and the antibacterial activity of the N-doped TiO2 films stronger slightly with the increase of the annealing temperature.

Info:

Periodical:

Advanced Materials Research (Volumes 189-193)

Edited by:

Zhengyi Jiang, Shanqing Li, Jianmin Zeng, Xiaoping Liao and Daoguo Yang

Pages:

1258-1262

DOI:

10.4028/www.scientific.net/AMR.189-193.1258

Citation:

X. L. Cheng et al., "Influence of Annealing Temperature on the Antibacterial Activities and Photoactivity of N-Doped TiO2 Films by Ion Beam Assistance", Advanced Materials Research, Vols. 189-193, pp. 1258-1262, 2011

Online since:

February 2011

Export:

Price:

$35.00

[1] N. Wehbe, M. Jaafar, C. Guillard, J.M. Herrmann, S. Miachon, E. Puzenat and N. Guilhaume: Appl. Catal. A: Gen. Vol 368 (2009), p.1.

[2] L. Ma, M. Liu, T. Y Peng, K. Fan, L. L Lu and K. Dai: Mater Chem. Phys. Vol. 118 (2009), p.477.

[3] Y. S Okabe and T. Yajima: Surf. Coat. Technol. Vol. 201 (2007), p.8352.

[4] W.A. Daoud, J.H. Xin and Y.H. Zhang: Surf. Sci. Vol. 599 (2005), p.69.

[5] D.S. Huang, R.J. Zeng, C.F. Chen and Y.H. Li: Acta Phys. -Chim. Sin. Vol. 23 (2007), p.1037.

[6] M.C. Yang, T.S. Yang and M.S. Wong: Thin Solid Films 469-470 (2004), p.1.

[7] D.R. Acosta, A. Martı´nez and R. Carlos: Thin Solid Films Vol. 490 (2005), p.112.

[8] G. Liu, F. Li, Z.G. Chen, G.Q. Lu, and H.M. Cheng: J. Solid State Chem. Vol. 179 (2006), p.331.

[9] Y. Hatanaka, H. Naito, S. Itou, M. Kando: Appl. Surf. Sci. Vol. 244 (2005), p.554.

[10] H. Irie, Y. Watanabe and K. Hashimoto: Phys. Chem. B Vol. 107 (2003), p.5483.

In order to see related information, you need to Login.