Influence of Annealing Temperature on the Antibacterial Activities and Photoactivity of N-Doped TiO2 Films by Ion Beam Assistance
The N-doped TiO2 films were prepared by cathode vacuum arc deposition with ion beam assisted. Influence of annealing temperature on the microstructure, optical property, photocatalytic activity and antibacterial activities of the N-doped TiO2 films was studied. The experimental results indicate that annealing treatment significantly affects both microstructure and photoactivity. All the as deposited N-doped TiO2 films retained an amorphous structure, the crystalline structure of N-doped TiO2 films annealed in the range 400°C- 600°C were examined to be of anatase structure with a (101) preferential orientation，photocatalytic activity of the N-doped TiO2 film annealed at 500°C was best under visible light, The N-doped TiO2 films against E. coli and S. aureus had more than 99% antibacterial rate, and the antibacterial activity of the N-doped TiO2 films stronger slightly with the increase of the annealing temperature.
Zhengyi Jiang, Shanqing Li, Jianmin Zeng, Xiaoping Liao and Daoguo Yang
X. L. Cheng et al., "Influence of Annealing Temperature on the Antibacterial Activities and Photoactivity of N-Doped TiO2 Films by Ion Beam Assistance", Advanced Materials Research, Vols. 189-193, pp. 1258-1262, 2011