Chemical Vapor Deposition (CVD) of ZrC Coatings from ZrCl4-C3H6-H2
ZrC coatings were prepared by CVD using ZrCl4, C3H6, and H2 as the precursors. The mechanisms responsible for the effects of deposition temperature, H2 flow rate and inlet C/Zr ratio on the ZrC coatings were studied based on the deposition mechanism of ZrC. The results indicate that the ZrC morphologies change from a loose spherical structure to a cauliflower structure, then to a glassy structure as the deposition temperature increases from 1050°C to 1150°C, then to 1250°C. The carbon content in the ZrC coatings increases with increasing the deposition temperature. Higher inlet C/Zr ratio can lead to rough surfaces and higher carbon content. Reasonable H2 concentration can inhibit carbon deposition, and lead to a cauliflower structure.
Zhengyi Jiang, Shanqing Li, Jianmin Zeng, Xiaoping Liao and Daoguo Yang
Q. M. Liu et al., "Chemical Vapor Deposition (CVD) of ZrC Coatings from ZrCl4-C3H6-H2", Advanced Materials Research, Vols. 189-193, pp. 648-652, 2011