Room Temperature Deposition and Properties of AZO Thin Films by DC Magnetron Sputtering under Different Plasma Power

Abstract:

Article Preview

To evaluate the influence of plasma power on the structural, electrical and optical properties of Al-doped ZnO (AZO) films, a set of polycrystalline AZO samples under different plasma power were deposited on glass substrates at room temperature. X-ray diffraction technique (XRD), four-point probe measurements and spectrophotometer were used to characterize these films. XRD shows that all AZO films have a hexagonal wurtzite structure with prominent (002) orientation. With the plasma power increasing, the grain size first increases and then decreases. The largest grain size of 23.6 nm in the films is obtained at the plasma power of 123 W. The average optical transmittance of AZO films is over 80% in the visible region. The lowest resistivity of 1.0×10-3Ω•cm is obtained under the plasma power of 220 W.

Info:

Periodical:

Advanced Materials Research (Volumes 194-196)

Edited by:

Jianmin Zeng, Taosen Li, Shaojian Ma, Zhengyi Jiang and Daoguo Yang

Pages:

2440-2443

DOI:

10.4028/www.scientific.net/AMR.194-196.2440

Citation:

J. R. Chi et al., "Room Temperature Deposition and Properties of AZO Thin Films by DC Magnetron Sputtering under Different Plasma Power", Advanced Materials Research, Vols. 194-196, pp. 2440-2443, 2011

Online since:

February 2011

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.