The Range Distribution of Nd Ions Implanted in Silicon Crystal

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Due to the need to reduce electronic device sizes, it is very important to consider the depth distribution of ions implanted into a crystalline target. The mean projected ranges and range straggling for energetic 200 – 500 keV Nd ions implanted in single crystal silicon (c-Si) at room temperature were measured by means of Rutherford backscattering followed by spectrum analysis. The measured results are compared with Monte Carlo code (SRIM2006) predictions. Our results show that the measured values of the mean projected range are good agreement with the SRIM calculated values; for the range straggling , the difference between the experiment data and the calculated results is much higher than that of .

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Edited by:

Zeng Zhu

Pages:

593-596

DOI:

10.4028/www.scientific.net/AMR.214.593

Citation:

X. F. Qin et al., "The Range Distribution of Nd Ions Implanted in Silicon Crystal", Advanced Materials Research, Vol. 214, pp. 593-596, 2011

Online since:

February 2011

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$38.00

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