Effect of Annealing Treatments on Mg(Zr0.05Ti0.95)O3 Thin Films by Sol-Gel Method

Abstract:

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Dielectric, Optical properties and microstructures of Mg(Zr0.05Ti0.95)O3 thin films prepared by sol-gel method on n-type Si(100) substrates at different annealing temperatures have been investigated. The selected-area diffraction pattern showed that the deposited films exhibited a polycrystalline microstructure. All films exhibited Mg(Zr0.05Ti0.95)O3 peaks orientation perpendicular to the substrate surface and the grain size with the increase in the annealing temperature. A dielectric constant of 7.4 and an optical bandgap of 3.7 were obtained for the prepared films.

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Periodical:

Edited by:

Yuhang Yang, Xilong Qu, Yiping Luo and Aimin Yang

Pages:

518-522

DOI:

10.4028/www.scientific.net/AMR.216.518

Citation:

C. F. Tseng et al., "Effect of Annealing Treatments on Mg(Zr0.05Ti0.95)O3 Thin Films by Sol-Gel Method", Advanced Materials Research, Vol. 216, pp. 518-522, 2011

Online since:

March 2011

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$35.00

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