Low Cost and High Resolution X-Ray Lithography for Fabrication of Microactuator

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In this work, low-cost and high resolution X-ray lithography is developed by employing low-cost sputtered lift-off lead film on mylar sheet substrate and applied for fabrication of electrostatic actuators. X-ray mask was fabricated by conventional photolithography, Pb sputtering and lift-off process. The Pb mask is used for X-ray lithography of electrostatic actuator structures with 5 µm interdigitate electrodes. For 140 µm-thick SU-8 photoresist on Cr-coated glass substrates, Pb film thickness of around 10 µm was used to block X-ray with 95% x-ray image contrast at a critical dose of 4,200mJ/cm3. A high aspect ratio of 26.5 of SU8 microstructure with 5 µm lateral resolution has been achieved by the developed low cost Pb based X-ray mask. In addition, a steep sidewall angle of nearly 90o for SU-8 structure is confirmed. The results demonstrate that the Pb based X-ray mask offers high resolution X-ray lithography at a very low cost and is promising for microactuator applications.

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Periodical:

Edited by:

Lynn Khine and Julius M. Tsai

Pages:

66-69

DOI:

10.4028/www.scientific.net/AMR.254.66

Citation:

P. Kerdlapee et al., "Low Cost and High Resolution X-Ray Lithography for Fabrication of Microactuator", Advanced Materials Research, Vol. 254, pp. 66-69, 2011

Online since:

May 2011

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$35.00

[1] W. -P. Shih, Y. Cheng and G. -J. Hwang., Low-cost X-ray conformal mask using dry film resist., Microelectronic Engineering. 40 (1998) 43-50.

DOI: 10.1016/s0167-9317(97)00190-1

[2] Schmidt, G. Himmelsbach and H. Wolf., High precision mask fabrication for deep X-ray lithography using 40 kV shaped electron beam lithography., Microelectronic Engineering. 57-58 (2001) 761-767.

DOI: 10.1016/s0167-9317(01)00479-8

[3] Y. Shew, Y. Cheng, W.P. Shih, M. Lu, W.H. Lee, High precision low cost mask for X-ray lithography, Microsys. Technol. 4 (1998) 66-69.

DOI: 10.1007/s005420050097

[4] Henry I. Smith, D.J.D. Carter and R. Menon. Soft X-ray for deep sub-100nm lithography, with and without mask., Microelectronic Engineering. 53 (2000) 77-84.

[5] S. Mongpraneet, A. Wisitsora-at, R. Phatthanakun, N. Chomnawang, and A. Tuantranont., Low Cost X-ray Mask Based on Micropattern Sputtered Lead Film for X-ray Lithography., J. Vac. Sci. Technol. B. 27 (2009)1299-1303.

DOI: 10.1116/1.3117259

[6] X-ray data booklet, Center for X-ray Optics and Advanced Light Source, Lawrence Berkeley National Laboratory, (2001).

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