Evaluation of Mechanical Properties and Various Pile-Up of Plate-Type Polymer Using Nanoindenter

Abstract:

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For producing high-quality components through a nanoimprint lithographic (NIL) process, it is important to measure quantitative properties about the behavior of polymers with regard to thermal-nano variation. NanoScale indents can be used as cells for molecular electronics and drug delivery and slots for integration into nanodevices; they can be used to detect defects for tailoring the structure and properties. This study evaluates the mechanical characteristics of polymers, such as Polymethylmetacrylate (PMMA) and COP (Cyclo-olefin Polymer), at high temperatures for the manufacture of nano/micro-sized polymers through thermal nanoindentation at high temperatures. At high temperatures, the mechanical properties of polymers exhibit extreme variation. When a polymer is heated, it becomes softer than at room temperature. In this regard, it is especially important to study the mechanical properties of polymers at high temperatures.

Info:

Periodical:

Advanced Materials Research (Volumes 264-265)

Edited by:

M.S.J. Hashmi, S. Mridha and S. Naher

Pages:

675-680

DOI:

10.4028/www.scientific.net/AMR.264-265.675

Citation:

Y.N. Joung et al., "Evaluation of Mechanical Properties and Various Pile-Up of Plate-Type Polymer Using Nanoindenter", Advanced Materials Research, Vols. 264-265, pp. 675-680, 2011

Online since:

June 2011

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Price:

$35.00

[1] D. Hardt, B. Ganesan, W. Qi, Dirckx, M. and A. Rzepniewski: Process Control in Micro-Embossing – A Review, Singapore MIT Alliance Programme (SMA) in Innovation in Manufacturing Systems and Technology (IMST) (2004).

[2] C.G. Choi: Fabrication of optical waveguides in thermosetting polymers using hot embossing, J. Micromech. Microeng., Vol. 14 (2004), 945-949.

DOI: 10.1088/0960-1317/14/7/015

[3] W.S. Kim, K.B. Yoon, B.S. Bae: Nanopatterning of photonic crystals with a photocurable silica–titania organic–inorganic hybrid material by a UV-based nanoimprint technique, J. Mater. Chem., Vol. 15 ( 2005), 4535-4539.

DOI: 10.1039/b509622g

[4] K. Ishihara, M. Fujita, I. Matusubara, T. Asano, S. Noda: Direct Fabrication of Photonic Crystal on Glass Substrate by Nanoimprint Lithography, Japanese Journal of Applied Physics, Vol. 45 (2006), 210-212.

DOI: 10.1143/jjap.45.l210

[5] B. Heidari, I. Maximov, L. Montelius: Nanoimprint lithography at the 6 in. wafer scale, J. Vac. Sci. Technol. B, Vol. 18 (2000), 3557-3560.

DOI: 10.1116/1.1326923

[6] N. S. Cameron, H. Roberge, T. Veres, S. C. Jakeway, H. J. Crabtree: High fidelity, high yield production of microfluidic devices by hot embossing lithography: rheology and stiction, Lab Chip, Vol. 6 (2006), 936-941.

DOI: 10.1039/b600584e

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