Effects of Sputtering Power on the Microstructure of Mg2Si Films by Magnetron Sputtering

Abstract:

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Epitaxial films of magnesium silicide Mg2Si are prepared by magnetron sputtering system on Si (111) substrates. The crystal structures and the surface morphology of the Mg2Si films are characterized by X-ray diffraction and Field emission scanning electron microscope. The microstructure of Mg2Si films is obtained. The results show that the Mg2Si films have a strong Mg2Si (220) preferential orientation with sputtering power increases, the Mg2Si (220) peak intensity increases with increasing sputtering power before 100W and then decreases with increasing sputtering power.

Info:

Periodical:

Advanced Materials Research (Volumes 287-290)

Edited by:

Jinglong Bu, Pengcheng Wang, Liqun Ai, Xiaoming Sang, Yungang Li

Pages:

2298-2301

DOI:

10.4028/www.scientific.net/AMR.287-290.2298

Citation:

C. H. Zhang and Z. Q. Yu, "Effects of Sputtering Power on the Microstructure of Mg2Si Films by Magnetron Sputtering", Advanced Materials Research, Vols. 287-290, pp. 2298-2301, 2011

Online since:

July 2011

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Price:

$35.00

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