Elemental Identification of Materials Using Optical Emission Spectra during Electric Discharge Machining


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Elemental identification of material is a prime most important in material science field. Electric discharge is used for material elemental identification with optical emission spectroscopy. During electric discharge machining between two electrodes plasma is generated which emits intense radiation in the UV-Visible region. The generated plasma captured by optical emission spectroscopic technique and elements are identified from recorded spectra by matching with standard NIST database. This method is simple, rapid, and inexpensive compared to all other elemental identification method. The elements of the metal, semiconductors, even insulators can be identified without much difficulty. The elemental identification of material has been investigated in macro and micro level.



Advanced Materials Research (Volumes 299-300)

Edited by:

Jianzhong Wang and Jingang Qi






S. Kanmani Subbu et al., "Elemental Identification of Materials Using Optical Emission Spectra during Electric Discharge Machining", Advanced Materials Research, Vols. 299-300, pp. 1330-1333, 2011

Online since:

July 2011




[1] A. Bogaerts, E. Neyts, R. Gijbels, J.V.D. Mullen, Spectrochim. Acta., Part B. Vol. 57 (2002), p.609.

[2] A. Calka, D. Wexlex, Nat. Vol. 419 (2002), p.147.

[3] D. P. Haneley, J. Tuchoiski, Structural acoustics and vibration, Proceeding of meeting on Acoustics, Baltimore, Maryland, April 19-23, 9 (2010), p.201.

[4] S. Kanmani Subbu, G. Karthikeyan, J. Ramkumar, and S. Dhamodaran, Int. J. Adv. Manu. Technol., in press.

[5] R.J.C. Brown and M.J.T. Milton, Trends Anal. Chem. Vol. 24 (2005), p.266.

[6] Y. Takahash, K. Hayashi, and E. Matsubara, Phys. Rev. Vol. 71 (2005), p.134107.

[7] R. Gaudiuso, M.D. Aglio, O.D. Pascale, G.S. Senesi, and A.D. Giacomo; Sens., Vol. 10 (2010), p.7434.

[8] Y. Lin, Q. Yu, W. Hang, and B. Huang, Spectrochim. Acta, Part B, Vol . 65 (2010), p.871.

[9] B.W. Ward, M. Ward, D. Edwards, N.P. Economou, J. Vac. Sci. Technol. B. Vol. 6 (1988), p.584130.

[10] Information on http: /physics. nist. gov/PhysrefData/ASD/index. html.

[11] Information on http: /www. cfa. harvard. edu/amp/ampdata/kurucz23/sekur. html.

[12] A. Curodeau, M. Richard, and L. Frohn-Villeneuve, J. Mater. Process. Technol.  Vol. 149 (2004), p.278.

[13] B. Lauwers, J.P. Kruth, W. Liu, W. Eeraerts, B. Schacht, and P. Bleys, J. Mater. Process. Technol. Vol. 14 (2004), p.347.

[14] W. I. Mahdi, M. A. Tawfiq, and S. H. Aghdeab, Eng. & Tech. J. Vol. 27 (2009), p.1027.

[15] Naveen Beri, Anil Kumar, S. Maheshwari, and C. Sharma, Int. J. Mach. Mach. Mater. Vol. 9 (2011), p.103.

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