RBS Study of Multilayer Structure Material of Si/SiO2 Nano Films

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An absorber-emitter system was fabricated using a multi-layer structure of amorphous silicon and silicon oxide thin films. The layers were deposited using RF magnetron sputtering system. The thin films were alternated in a periodic structure to form a one-dimensional photonic crystal. Each period in the crystal consisted of one layer of 57 nm thick silicon and a 100 nm thick silicon oxide layer. Several samples were prepared consisted on different periods (N= 1, 2, 3, 4, 5 and 10). Rutherford Backscattering Spectrometry technique (RBS) was used to verify the number of layers and their alternation, checking the thicknesses and determine the real stoichiometry in each layer of Si and SiOx.

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Periodical:

Edited by:

Maher Soueidan, Mohamad Roumié and Pierre Masri

Pages:

310-313

DOI:

10.4028/www.scientific.net/AMR.324.310

Citation:

M. Roumie et al., "RBS Study of Multilayer Structure Material of Si/SiO2 Nano Films", Advanced Materials Research, Vol. 324, pp. 310-313, 2011

Online since:

August 2011

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$35.00

[1] S. Y. Lin, J. G. Fleming, E. Chow, and J. Bur (2000) Enhancement and suppression of thermal emission by three-dimensional photonic crystal, Phys. Rev B 62, pp. R2243.

DOI: 10.1103/physrevb.62.r2243

[2] M. Florescu, H. Lee, I. Puscasu, M. Pralle, L. Florescu, D. Z. Ting, and J. P. Dowling (2007) Improving solar cell efficiency using photonic band-gap materials, Sol. Ene. Mat. and sol. Cel., 91, p.1599.

DOI: 10.1016/j.solmat.2007.05.001

[3] J. W. Haus, G. Kurizki (eds) (1994) Principles and Applications of Photonic Band Gap Structures, J. Mod. Opt. 41, p.345 (special issue).

[4] J.R. Tesmer, M. Nastasi, J. Ch. Barbour, C.J. Maggiore, J.W. Mayer, Handbook of Modern Ion Beam Materials Analysis, MRS, Pittsburgh, PA, (1995).

[5] M. Mayer, SIMNRA User's Guide, Report IPP 9/113, Max-Planck-Institut fur Plasmaphysik, Garching, Germany, (1997).

[6] M. Roumie, B. Nsouli, K. Zahraman, A. Reslan, First accelerator based ion beam analysis facility in Lebanon: development and applications, Nucl. Instr. And Meth. B 219–220 (2004) 389.

DOI: 10.1016/j.nimb.2004.01.088

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