The Growth Mechanism of LSGM Thin Film Electrolyte by RF Magnetron Sputtering


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In order to discuss the growth mechanism of LSGM films, La0.9Sr0.1Ga0.8Mg0.2O2.85 (LSGM) thin films electrolytes were fabricated on Si substrates by RF magnetron sputtering. The atomic force microscope (AFM) and X-ray diffraction analyzer (XRD) were used to analyze film surface morphology and phase components. The results show that LSGM films are grown with island structure. When the deposition time increases to 30min, the preferred growth orientations appears, which is (112) crystal face. The longer deposition time is, and the rougher the surface possesses.



Advanced Materials Research (Volumes 581-582)

Edited by:

Jimmy (C.M.) Kao, Wen-Pei Sung and Ran Chen




J. Xing et al., "The Growth Mechanism of LSGM Thin Film Electrolyte by RF Magnetron Sputtering", Advanced Materials Research, Vols. 581-582, pp. 735-738, 2012

Online since:

October 2012




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