Characterization of Transparent Conducting Al:ZnO Thin Films Deposited by Chemical Spray Pyrolysis
Nanocrystalline undoped and Al doped ZnO thin films were synthesized by the chemical spray pyrolysis of Zinc acetate and Aluminium chloride solution. The optoelectronic properties of undoped and Al:ZnO films were investigated. The XRD patterns of films were preferably oriented along c-axis [0 0 2] plane with the hexagonal wurtzite structure. The Al-doping caused no additional X-ray diffraction peaks when compared with XRD of undoped film, indicating Al2O3 content was below the detection limit. The crystallite size of undoped and Al doped film was 48 nm and 51nm respectively, as measured from X-ray diffractogram. The films are of high optical transmittance (≥ 90%). The resistivity of the film was found to decrease because of Al doping. The dark resistivity measurement for Al:ZnO film was of the order of 10-3 Ω-1cm-1. The band gap energy of the film was found to vary from 3.25 to 3.32eV indicating the Moss Burstein shift. Al:ZnO films can be used as transparent conducting oxide layers for photovoltaic applications.
S. Ray, S.K. Nath, A. Kumar, R.C. Agarwala, V. Agarwala, G.P. Chaudhari, B.S.S. Daniel
C.M. Mahajan et al., "Characterization of Transparent Conducting Al:ZnO Thin Films Deposited by Chemical Spray Pyrolysis", Advanced Materials Research, Vol. 67, pp. 103-108, 2009