Structural and Optical Properties of SnO2 Films Grown on 6H-SiC by MOCVD

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SnO2 thin films have been deposited on 6H-SiC(0001) substrates by metalorganic chemical vapor deposition (MOCVD) system. The structural and optical properties of SnO2 films were investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM) and spectrophotometry. The XRD analysis revealed that the prepared samples were SnO2 epitaxial films of rutile structure with a clear relationship of SnO2(100)// 6H-SiC(0001). The average transmittance for the deposited SnO2 samples in the visible range was about 60%.

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Periodical:

Advanced Materials Research (Volumes 79-82)

Edited by:

Yansheng Yin and Xin Wang

Pages:

1539-1542

Citation:

Z. Zhu et al., "Structural and Optical Properties of SnO2 Films Grown on 6H-SiC by MOCVD", Advanced Materials Research, Vols. 79-82, pp. 1539-1542, 2009

Online since:

August 2009

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$41.00

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