Nano Fabrication Technology of Selective Removal and Optical Assistance


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This study presents a new modus of selective removal technology and an excimer assistance on TFT-LCD above the five generation used to carry out the selective removal of nanostructures layers from optoelectronic flat panel displays’ color filter surface as well as the complete removal from the substrate of the ITO thin-films, RGB layer or resin BM layer. Displays’ color filters are produced using optoelectronic semiconductor fabrication techniques though the low yield during production can still be improved. Through the precise removal process of chemical etching and excimer assistance, the selective removals of different layers on top of color filter substrates will cut down the production costs. It can individually pick out and remove defective films or directly remove all films but the Cr layer or bare glass. Experimental results point out defective ITO thin-films, RGB layers, or resin BM layer can now be recycled with great precision. When the ITO proves difficult to remove, excimer-light can also be used to help with its removal. During the color filter recycle process the use of a 172nm excimer-light can remove stubborn film residues, effectively improving the quality of recycled color filters. This study offers a recovery module for defective diaplays’ color filters can be reused and fed back into the color filter production line, therefore provides many benefits in the industry of optoelectronic semiconductor.



Advanced Materials Research (Volumes 79-82)

Edited by:

Yansheng Yin and Xin Wang






P. S. Pa "Nano Fabrication Technology of Selective Removal and Optical Assistance", Advanced Materials Research, Vols. 79-82, pp. 369-372, 2009

Online since:

August 2009





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