Fabrication of Micro Three Dimensional Structures by Two Photon Polymerization with SiO/Resin
In this paper we presented the synthesis of TEOS with photoresist in order to use it like a hybrid material for 3D printer on the micrometer scale by means of the two-photon polymerization process, in which two photon are absorbed simultaneously by the material using an ultrafast laser causing its polymerization. We analyzed the mix of TEOS and photoresist with UV-VIS and FTIR spectrometers, checking that complies with two important conditions: has an optical transmission at 780 nm and absorbs at 390 nm. Finally we fabricated micro-structures with a new hybrid material; TEOS does not absorb the laser in this system and does not interfere with the formation of a three-dimensional structure. After formation the 3D microstructure, samples were heated to form the SiO. These samples of microstructures were observed under digital microscope and SEM.
M. G. del R. Herrera Salazar et al., "Fabrication of Micro Three Dimensional Structures by Two Photon Polymerization with SiO/Resin", Advances in Science and Technology, Vol. 100, pp. 93-99, 2017