Electron Transport and Dielectric Breakdown Kinetics in Pr2O3 High K Films

Abstract:

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Praseodymium based dielectric thin films have been deposited by Metal-Organic Chemical Vapour Deposition (MOCVD). Special emphasis has been placed upon deposition parameters crucial to obtain Pr2O3 phase and upon interfacial characterization. In addition, dielectric properties have been correlated to structural and compositional characteristics of praseodymium containing films. The breakdown (BD) characteristics of Pr2O3 films have been investigated by an innovative and handling approach based on C-AFM. Moreover, the BD kinetics have been elucidated considering the role of defects in the conduction mechanisms.

Info:

Periodical:

Edited by:

P. VINCENZINI and V. BUSCAGLIA

Pages:

21-26

DOI:

10.4028/www.scientific.net/AST.46.21

Citation:

P. Fiorenza et al., "Electron Transport and Dielectric Breakdown Kinetics in Pr2O3 High K Films", Advances in Science and Technology, Vol. 46, pp. 21-26, 2006

Online since:

October 2006

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Price:

$35.00

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