The effect of synchrotron radiation, upon films that had been deposited by means of plasma-enhanced chemical vapor deposition, was investigated. It was found that the synchrotron radiation had an effect upon the oxide structure, as confirmed by means of  in situ  infra-red reflection adsorption spectroscopy. As the substrate temperature was increased to 373K, the oxide structure was loosened by irradiation, and surface migration was observed. The surface migration that was induced by synchrotron radiation led to an increase in surface roughness and to the formation of hemispherical bubbles on the film surface. This was confirmed by means of atomic force microscopy. The generation of O-related paramagnetic defects was detected by using electron spin resonance techniques.

Y.B.Park, S.W.Rhee, Y.Imaizumi, T.Urisu: Journal of Applied Physics, 1996, 80[2], 1236-8