Paper eintragenThe incorporation and diffusion of H in undoped plasma-deposited hydrogenated amorphous films were studied, as a function of the H concentration, by means of secondary ion mass spectrometry profiling. The results showed that, between 1 and 10at%, a structure-related H solubility limited the incorporation of H. The observed concentration dependence of the H diffusion coefficient could be explained in terms of a band model which involved a rather mobile H chemical potential for material with a low H concentration.

W.Beyer: Physica Status Solidi A, 1997, 159[1], 53-63