The diffusion of O in silica glass was modelled as though it resulted from the diffusion of molecular O or water into the glass, plus isotopic exchange with O in the Si-O network. This model gave good agreement with experimental data. In many experiments, low H2O concentrations were thought to contribute to the diffusion profiles. It was concluded that network diffusion was too slow, and surface exchange was too rapid, to contribute to the experimental diffusion profiles of O isotopes.

R.H.Doremus: Journal of the Electrochemical Society, 1996, 143[6], 1992-5