Compositionally modulated amorphous multi-layers, with a repeat length of 3.2nm, were prepared by using an ion-beam sputtering technique. Interdiffusion in such multi-layers was investigated by using an  in situ  X-ray diffraction method. The interdiffusion coefficient was determined by measuring the intensity decay of the first-order modulation peak as a function of annealing time. The temperature dependence of the interdiffusion coefficient, at temperatures ranging from 423 to 523K, could be described by:

D (m2/s) = 2.2 x 10-18exp[-0.55(eV)/kT]

M.Zhang, W.Yu, W.H.Wang, W.K.Wang: Thin Solid Films, 1996, 287[1-2], 293-6