The bulk diffusivity was measured by using serial sectioning methods (sputtering by Ar ions in a direct-current glow discharge) at temperatures of 893 and 953K (table 24). It was proved that the contribution which constitutional vacancies made to the bulk diffusion mobility of Ni atoms was negligible at temperatures down to 893K.

J.Cermák, I.Stloukal: Scripta Materialia, 1997, 36[4], 433-7

 

 

 

Table 24

Bulk Diffusivity of 63Ni in B-Doped Ni3Al

 

 

Temperature (K)

 

Al (at%)

 

B (at%)

 

D (m2/s)

 

 

893

 

24.08

 

0

 

2.20 x 10-21

893

25.38

0

2.03 x 10-22

893

24.04

0.108

5.87 x 10-22

893

25.67

0.108

1.70 x 10-21

893

26.80

0.108

6.68 x 10-22

893

24.37

0.268

2.93 x 10-21

893

25.51

0.268

3.42 x 10-21

893

26.48

0.268

1.11 x 10-21

953

24.08

0

4.29 x 10-20

953

24.04

0.108

4.38 x 10-20

953

25.67

0.108

6.88 x 10-20

953

24.37

0.268

5.28 x 10-21