The effect of HCl upon the oxidation-enhanced diffusion of As at temperatures of 1000, 1100, and 1150C was investigated by using secondary ion mass spectrometry. The data obtained were used to determine the parameters of a model which had previously been developed in order to describe the retardation of oxidation-enhanced diffusion. Good agreement was found between theory and experiment.

R.Subrahmanyan, H.Z.Massoud, R.B.Fair: Journal of Applied Physics, 1987, 61[10], 4804-7