Crystals which contained Cu atoms that had been introduced by high-temperature diffusion were investigated by means of Lang X-ray transmission topography. This revealed increases and decreases in the dislocation image widths as a function of the diffusion annealing time. In one case, a build-up of decorating particles on the dislocations occurred during more prolonged decoration, with widening of the topographic images of these dislocations. During short-term decoration, some compensation of defect deformation fields was noted, and shortening of the above images occurred. It was concluded that the observed effects depended not only upon the type of intrinsic impurities which took part in forming Cottrell atmospheres, but also upon the duration of the diffusion annealing. The interaction of dislocations with impurities was confirmed by studying the reflectivity of decorated samples, using double-crystal spectrometry.

J.Auleytner, M.J.Skorokhod, L.I.Datsenko, V.I.Khrupa: Acta Physica Polonica, 1996, 90[3], 541-6