The defect properties of single crystals were reviewed with regard to intrinsic and impurity-related cation and anion point defects, optical transitions in defects and their luminescence emissions, color centers, the electronic structure of B2+, Al2+, Zn+ and [Li]0 impurity defects, accumulation and annealing of point defects (table 2), thermally stimulated luminescence, non-isothermal annealing of paramagnetic centers, and thermally stimulated recombination processes. The study of elementary point defects in this oxide, and of the radiative decay of low-energy electronic excitations showed that there were both free excitons of high mobility and favorable conditions for self-trapping. The present oxide exhibited 2 channels for exciton self-trapping. These channels were differentiated by their hole core structure, and their spectral and luminescence characteristics. It followed that a unique situation was possible in this oxide when, during electron and hole recombination, the preferred creation of self-trapped excitons occurred whose radiative annihilation determined the intrinsic luminescence at 4.9eV.
I.N.Ogorodnikov, A.V.Kruzhalov: Materials Science Forum, 1997, 239-241, 51-6
Table 2
Point Defects in BeO Single Crystals
Defect |
Creation |
Annealing Conditions
|
V- = Vch+ |
growth, neutron irradiation |
620K, 1.85eV, V- Vc + h+ |
V0 = Vc2h+ | growth, neutron irradiation | 550K, 1.6eV, V0 V- + h+ |
VB = Vch+-B3+ | growth, X-irradiation | 680K, 2.0eV, VB VB- + h+ |
[Li]0 = Li+h+ | growth, X-irradiation | 450K, 1.5eV, [Li]0 Li+ + h+ |
B2+ = B3+e- | growth, X-irradiation | 540K, 1.5-1.77eV, B2+ B3+ + e- |
B2+ = B3+e-* | growth, -irradiation | above 90K, B2+ B3+ + e- |
Al2+ = Al3+e- | growth, X-irradiation | 580K, 1.5-1.77eV, Al2+ Al3+ + e- |
F2- = F-e- | growth, X-irradiation | 420-450K, F2- F- + e- |
Zn2+O2-h+ | growth, X-irradiation | 160K, 0.56eV, Zn2+O2-h+ [Zn]0 |
Zn+ = Zn2+e- | growth, X-irradiation | 310K, 0.92eV, Zn+ Zn2+ + e- |
F+ = Vae- | neutron irradiation | above 900K, ionic process |
F = Va2e- | neutron irradiation | above 900K, ionic process
|
* octahedral interstitial site