The spatial distribution of X-ray diffusion scattering intensity which resulted from additional CuO atomic layers in the Cu3B2AO7 structure was studied. The diffraction pattern changes which were caused by an increase in stacking-fault density, and local atomic layers in the vicinity of stacking faults, were deduced. Some X-ray techniques were described for the determination of the stacking-fault density and local changes in interplanar spacing.

N.D.Rud, A.I.Ustinov: Journal of Applied Crystallography, 1996, 29[2], 159-63