The diffusion of H in molecular beam deposited amorphous material, or in glow discharge films, which had been grown at temperatures below 200C was studied. It was concluded that the fast diffusion which was observed was due to the presence of the micro-voids and columnar structural defects which were typical of these materials.

V.Petrova-Koch, H.P.Zeindl, J.Herion, W.Beyer: Journal of Non-Crystalline Solids, 1987, 97-98, 807-10