Hydrogenated amorphous material was prepared by evaporation onto low-temperature substrates. It was typified by a low-density network and by the presence of (SiH2)n bonds. By monitoring the decay of the small-angle neutron-scattering intensity during the annealing of Si/Si:H/Si/Si:M/ ... (M = H28D72) multilayers, it was possible to follow simultaneously the densification of the Si network and the diffusion of H atoms.

M.Vergnat, S.Houssaïni, G.Marchal, P.Mangin, C.Vettier: Physical Review B, 1993, 47[12], 7584-7