The irreversible loss of interstitial Fe during the low-temperature annealing of n-type material was investigated by using capacitance techniques and strong electric fields. By analyzing isothermal annealing kinetics and Fei depth profiles, it was shown that the behavior of Fei was governed mainly by simple diffusion processes, in which the driving force was either the concentration gradient near to the sample surface, or was the electric field which was present in the depletion region.

T.Heiser, A.Mesli, N.Amroun: Materials Science Forum, 1992, 83-87, 173-8