An extensive review was presented of the subject of Na implantation. The topics which were covered included the solubility and diffusion of Na, radiation damage effects upon the diffusion of implanted Na atoms (radiation damage proper, defects produced by bombardment with other ions, residual defects), electrical characteristics of doped layers (electrical characteristics at room temperature, low-temperature Hall-effect studies, effect of radiation defects upon the electrical activity of Na), specific features of defect annealing, interaction of Na atoms with point defects, and Na-ion implantation.

V.M.Korol: Physica Status Solidi A, 1988, 110[1], 9-34