Two mechanisms (dissociative, kick-out) have been proposed for the site exchange of impurities. Here, numerical and approximate solutions to the basic equations which described these mechanisms (for Ni in Si) were considered. The object was to decide how these mechanisms might be distinguished by performing an in-diffusion experiment. It was found that the 2 mechanisms could be indistinguishable under certain conditions, if vacancies and self-interstitials coexisted.

H.Kitagawa, M.Yoshida: Japanese Journal of Applied Physics 1, 1992, 31[9A], 2859-63