Direct measurements were made of the diffusivity of interstitial O in Sb-doped Czochralski material at temperatures ranging from 750 to 1150C (table 66). Using secondary ion mass spectroscopy of the out-diffusion profiles, it was shown that the diffusivity was the same as that for lightly B-doped crystals which were heated under identical conditions over the temperature range studied.
A.S.Oates, W.Lin: Applied Physics Letters, 1988, 53[26], 2659-61
Table 66
Diffusivity of O in Doped Si
Type | T (C) | D (cm2/s) |
p | 1150 | 2.4 x 10-10 |
p | 1050 | 6.5 x 10-11 |
p | 950 | 7.3 x 10-12 |
p | 950 | 6.4 x 10-12 |
p | 850 | 1.4 x 10-12 |
p | 850 | 7.5 x 10-13 |
p | 750 | 3.3 x 10-14 |
p | 750 | 2.9 x 10-14 |
n | 1150 | 4.3 x 10-10 |
n | 1050 | 6.5 x 10-11 |
n | 950 | 1.4 x 10-11 |
n | 950 | 1.1 x 10-11 |
n | 850 | 1.7 x 10-12 |
n | 750 | 9.6 x 10-14 |