The diffusion behavior of Ni adatoms on Ni surfaces was studied by using a field ion microscope. The activation barrier heights were deduced to be equal to 0.22 and 0.59eV for self-diffusion on (111) and (001), and to 0.84eV for the ascension of (111) step-edge atoms. Visit site map data indicated that the mechanism of self-diffusion on (001) surfaces was atomic exchange.

Atomic Processes in Self-Diffusion of Ni Surfaces. T.Y.Fu, T.T.Tsong: Surface Science, 2000, 454-456, 571-4