A deactivation of acceptor In after mechanochemical polishing of p-type material was shown to result from the formation of a complex which involved In ions and a positively charged very fast-moving unknown defect. At temperatures of between 220 and 280K, the dissociation frequency of the complex and the diffusion coefficient of the unknown defect were thermally activated. In particular, the diffusion behavior was described by the expression:

D(cm2/s) = 50000 exp[-0.665(eV)/kT]

T.Zundel, J.Weber, B.Benson, P.O.Hahn, A.Schnegg, H.Prigge: Applied Physics Letters, 1988, 53[15], 1426-8