A simple resistance analogue was developed in order to simulate the effects of bulk diffusion and surface recombination upon H permeation through a single laminate. A permeation potential and permeation resistance were defined for bulk diffusion and surface recombination. General formulae were developed in order to analyze gas-driven permeation and plasma-driven permeation. Relationships between the permeation flux and the gas pressure in gas-driven permeation, or the incident flux in plasma-driven permeation, agreed well with the models.

W.M.Shu, Y.Hayashi, M.Sugisaki: Acta Materialia, 1996, 44[6], 2457-63