The effects of implanting Fe (1 to 2MeV, 1013 to 1014/cm2) were studied by means of secondary ion mass spectrometry, Rutherford back-scattering spectrometry channelling, and transmission electron microscopy. Damage production, recovery and defect-dopant interactions were studied during annealing (100 to 650C). It was found that a continuous buried amorphous layer was formed by doses of more than 3 x 1013/cm2. Re-growth of these amorphized layers, and its effect upon Fe redistribution and defect production, was investigated.

A.Carnera, A.Gasparotto, A.Scordilli, F.Priolo, C.Frigeri, G.Rossetto: Nuclear Instruments and Methods in Physics Research B, 1995, 96[1-2], 307-10