The intermixing and associated interdiffusion which resulted from the implantation of Ar ions into quantum-well structures was investigated. The experimentally determined mixing parameter of 150nm/eV was found to be large, as compared with the values that were reported for this parameter in metallic superlattices. It was consistent with an appreciable degree of interdiffusion which was associated with implantation.

I.Karla, J.H.C.Hogg, W.E.Hagston, J.Fatah, D.Shaw: Journal of Applied Physics, 1996, 79[4], 1898-902