A diffusion analysis was extended to the case of a lattice which contained 2 interstitial sites and the results were used to clarify the formation of a nitrided/non-nitrided N configuration at intermediate N contents, and an abnormally small (apparent) diffusion frequency factor. Each of these features characterized the newly developed nitrides. It was concluded that the diffusion mechanism of N atoms in the nitride lattice was a chemical reaction process rather than a free-diffusion process.

Y.D.Zhang, J.I.Budnick, W.A.Hines, D.P.Yang: Applied Physics Letters, 1995, 67[2], 208-10