The defects and defect reactions which were involved in the incorporation of water and H into oxides and silicates were reviewed, and the role which was played by computational techniques in investigating the structures and energies of H-containing defects in these materials was described.

C.R.A.Catlow, P.S.Baram, S.C.Parker, J.Purton, K.V.Wright: Philosophical Transactions of the Royal Society A, 1995, 350[1693], 265-76