Microchannel (macroporous) material was obtained by means of the photo-electrochemical etching of cylindrical pores having a high ratio of pore length to diameter. It was shown that the lattice of the microchannel material was essentially undistorted. The channels induced an additional diffuse scattering of X-rays. Thermal oxidation led to a marked distortion of the planes both parallel to, and normal to, the crystal surface and to the generation of dislocations.

Characterization of Microchannel Si by HRXD and Topography. I.L.Shulpina, E.V.Astrova, V.V.Ratnikov, A.D.Remenyuk, A.G.Tkachenko: Journal of Physics D, 2001, 34[10A], 140-3