The relationship between magnetic field strength and point defect density in crystals which were prepared in a cusp-shaped magnetic Czochralski apparatus was studied. The strength of the field was varied from 0.15 to 0.3T, while the crucible and crystal rotation rates were fixed at 8 and 18rpm, respectively. It was found that the strength of the field significantly affected melt motion; thus resulting in large changes in the point defect density in the crystal.

Numerical Study of the Effect of Operating Parameters on Point Defects in a Silicon Crystal During Czochralski Growth - Magnetic Effect. J.S.Kim, T.Lee: Journal of Crystal Growth, 2000, 219[3], 218-27