Interdiffusion was studied in Fe/Si trilayers which had been prepared by using ions of various energies, and the direct ion-beam deposition technique. Isotope-pure layers were deposited, and spin-polarized neutron reflectivity was used to determine the role of Fe diffusion in silicide formation. It was found that a non-magnetic silicide was formed which contained Fe from both the top and the bottom layers of the trilayers; thus suggesting the occurrence of diffusion completely across the spacer region. Electron microscopy revealed the presence of a silicide phase, and crystalline interface layers, in films which had been prepared using 30eV ions. Mixed and amorphous-like regions were found when using 100eV ions.

Interdiffusion in Direct Ion Beam Deposited Isotopic Fe/Si Trilayers. N.D.Telling, C.A.Faunce, M.J.Bonder, P.J.Grundy, D.G.Lord, J.A.Van den Berg, S.Langridge: Journal of Applied Physics, 2001, 89[11]. 7074-6