Morphological evolution of thin metallic films, i.e. beading, Ostwald-ripening and/or evaporation of a beaded film, on a substrate under annealing was a complex process which depended upon several parameters. However, under accurate experimental conditions, it was possible to study the growth of voids in thin continuous films (beading) separately. Various models describing this process were compared, and it was found that Brandon and Bradshaw’s description could be applied to these measurements. They suggested that the voids grow by surface self-diffusion of the metal atoms, independently of the substrate. Hence, from the time dependence of the uncovered surface, which was proportional to the area of voids, the surface self-diffusion coefficient of the metal could be derived. A new method, based upon Auger electron spectroscopy and atomic force microscopy, was used here to perform these measurements.

Auger Electron Spectroscopy Determination of Surface Self-Diffusion Coefficients from Growth of Voids in Thin Deposited Films. I.Beszeda, I.A.Szabó, E.G.Gontier-Moya: Applied Surface Science, 2003, 212-213, 787-91