Ultra-fine grained Cu, prepared by high-pressure torsion, was studied by means of slow positron implantation spectroscopy; with Doppler broadening measurements. In addition, conventional positron lifetime and Doppler broadening spectroscopy were used. The defects present in the specimens were identified, and their spatial distribution and depth profiles were determined. The results were explained in terms of those obtained by means of X-ray diffraction and transmission electron microscopy.

Investigation of Spatial Distribution of Defects in Ultra Fine-Grained Copper. J.Cížek, I.Procházka, O.Melikhova, G.Brauer, W.Anwand, R.Kužel, M.Cieslar, R.K.Islamgaliev: Applied Surface Science, 2002, 194[1-4], 140-4