Electron microscopy was used to study the microstructure of Mo which had been subjected to Y and Ti ion implantation in a cryogenic vacuum of 2 x 10-6 to 4 x 10-7Torr. Characteristic types of defect sub-structure were found, depending upon the distance from the surface of the target. Collective modes of stress relaxation in the surface and sub-surface layers of the ion-implanted samples were found. Modification of the defect sub-structure occurred at depths that were greater, by orders of magnitude, than the thickness of the ion-implanted layers.

Modification of the Defect Substructure of Molybdenum upon High-Dose Ion Implantation in High Vacuum. A.N.Tyumentsev, S.V.Ovchinnikov, Y.P.Pinzhin, A.D.Korotaev, M.V.Lupachev, A.G.Nikolaev, I.A.Ditenberg, I.Y.Litovchenko, G.Y.Yushkov: Physics of Metals and Metallography, 2002, 93[5], 450-7