The effect of chemical stress on diffusion in a hollow cylinder under plane strain and zero axial forces was investigated. Processes involving constant surface stress and constant surface potential were studied. Regardless of the plane strain or zero axial force, the influence of chemical stress on diffusion under constant surface potential was similar to that of constant surface stress. Chemical stress enhanced both the diffusion coefficient and the concentration. For a certain time, the level of concentration became lower; with a greater ratio of outer radius to inner radius for constant surface potential with given FXf and for constant surface stress with given FXi. Here, F was equal to 2EV/[9(1–v)RT] where E, V, R and T were the Young’s modulus, partial molal volume, gas constant, and absolute temperature, respectively. The Xi and Xf were initial and final mole fractions at boundary surfaces.

Effect of Chemical Stress on Diffusion in a Hollow Cylinder. W.L.Wang, S.Lee, J.R.Chen: Journal of Applied Physics, 2002, 91[12], 9584-90