Based upon the idea that dislocation patterning was a dissipative far-from-equilibrium process, with intrinsic fluctuations acting on the evolution of the dislocation ensemble at the mesoscopic scale, a stochastic dislocation dynamics model was presented which showed that fluctuations could induce patterning by dynamically stabilizing non-uniform dislocation distributions.

Statistical Mechanics Approach to Dislocation Cell Patterning. P.Hähner: Scripta

Materialia, 2002, 47[10], 705-11. See also: Scripta Materialia, 2002, 47[6], 415-21