Contact resistance, Auger depth profiling and transmission electron microscopic methods were used to study diffusion in thin-film couples at 573 to 777K. The results could be described by:

D (cm2/s) = 8.2 x 10-1 exp[-1.48(eV)/kT]

B.C.Johnson, C.L.Bauer, A.G.Jordan: Journal of Applied Physics, 1986, 59[4], 1147-55