An investigation was made of the H diffusion behavior, at temperatures ranging from 300 to 20K, by using internal friction techniques. Pulse-echo high-frequency measurements were used in the high-temperature regime, while flexural vibrations were used in the low-temperature regime. Relaxation which was due to 2 types of H complex was observed. These were H-pairs and O- (or N-) H pairs. The H pair was shown to have an enthalpy of motion of 1.265kcal/mol and a binding enthalpy of 1.490kcal/mol. The O- (or N-) H pair was shown to consist of a single H atom which was bound to the O interstitial with an enthalpy of about 2kcal/mol. The enthalpy of H motion in the strain-field of the O atom was 3.900kcal/mol. The relaxations were shown to obey a classical Arrhenius temperature-dependence at high temperatures, and to exhibit enhanced relaxation rates at low temperatures.
C.Baker, H.K.Birnbaum: Acta Metallurgica, 1973, 21[7], 865-72
Table 80
Isotope Effect for H and D Diffusion and Permeation in Nb
Temperature (C) | Process | Ratio (H/D) |
1020 | diffusion | 1.44 |
1020 | permeation | 1.3 |
980 | diffusion | 1.46 |
950 | permeation | 1.6 |
940 | permeation | 1.9 |
938 | diffusion | 1.46 |
870 | diffusion | 1.49 |
870 | permeation | 1.4 |
840 | permeation | 1.3 |
760 | permeation | 1.4 |