The use of dislocation modeling as a practical tool in the development of semiconducting devices was reviewed. Areas of application included the calculation of single dislocation behavior in transistors, large-scale simulations of relaxation in SiGe/Si and SiGe/SOI layer systems, and the investigation of dislocation nucleation at stress concentrators.

Dislocation Modeling for the Microelectronics Industry. K.W.Schwarz, D.Chidambarrao: Materials Science and Engineering A, 2005, 400-401, 435-8