A review was presented of thin-film growth and junction fabrication; including a brief summary of the relevant chemistry and physics. It was noted that the most serious problem was the high Mg vapour pressure required for phase stability. This made in situ film growth difficult. Therefore, most effort had been directed at 2-step growth: i.e. ex situ post-annealing, in situ physical vapour deposition and in situ chemical vapour deposition. Each growth method was described in detail and compared.

MgB2 Thin Films for Superconducting Electronics. M.Naito, K.Ueda: Superconductor Science and Technology, 2004, 17, R1-18